Supply, Delivery and Installation of Inductively Coupled Plasma Chemical Vapour Deposition System
key details
| Status | active |
|---|---|
| Category (CPV) | 38000000 |
| Region | Scotland |
| Deadline | 9 Sept 2026 |
| Procedure | open |
| OCID | ocds-h6vhtk-06dd11 |
description
Background
The UK urgently requires a sovereign, open-access advanced semiconductor packaging capability to close a well-evidenced market failure. Today, UK innovators in photonics and power electronics rely on overseas Outsourced Semiconductor Assembly and Test (OSAT) facilities for scaling to volume packaging, which fragments the supply chain, extends lead times, increases Intellectual Property (IP) leakage risk, and exposes critical technologies to geopolitical disruption.
The National Centre for Advanced Semiconductor Packaging (NCASP) is the missing link that converts research excellence into manufacturable products.
NCASP is creating an integrated, industry-led scale-up facility that connects UK device design to domestic, high-volume packaging, test and metrology – reducing time-to-market and anchoring value onshore.
Description
The University of Strathclyde has a requirement for an Inductively Coupled Plasma Chemical Vapour Deposition System.
documents
- Supply, Delivery and Installation of Inductively Coupled Plasma Chemical Vapour Deposition System , contractNotice
Documents are linked, not mirrored. They are served by the publishing authority and may require registration.
notice history
1 notice published against this procurement.
| Published | Type | Regime | Notice |
|---|---|---|---|
| 6 Aug 2026 | Contract notice (F02) | Earlier regulations | 074459-2026 |
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source
Published on Public Contracts Scotland. Contact details for named individuals are not reproduced on this site.