gvtcx

Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching

Swansea University Published 21 Jun 2021 Find a Tender

key details

Value£1,000,000
Statuscomplete
Category (CPV) 38000000 +3 more
RegionWales
Deadline18 Mar 2021
Procedureopen
OCIDocds-h6vhtk-029388

Award

SupplierValueDateStatus
SPTS Technologies · · active

description

This Tender Specification is for the supply and delivery of a Plasma Etch Tool for SiC etching. In procuring this system, the University is seeking to augment its well-established existing plasma etch and deposition tool set, expanding the capabilities that the CISM will be able to provide.

The new tool will be of strategic importance in delivering both frontside SiC etch capability for power MOSFET trench applications, and backside SiC via etch capability for GaN-on-SiC device applications. Reliability of the equipment is therefore paramount to maintaining, supporting and complimenting the wide array of experimental work that will be conducted within the facility.

notice history

2 notices published against this procurement.

PublishedTypeRegimeNotice
16 Feb 2021 Contract notice (F02) Earlier regulations 003105-2021
21 Jun 2021 Contract award notice (F03) Earlier regulations 014061-2021

more from Swansea University

all contracts from this buyer →

similar contracts awarded

Other awarded contracts in the same category. Useful for seeing who normally wins this kind of work, and at what value.

source

Published on Find a Tender. Contact details for named individuals are not reproduced on this site.