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Electron Beam and Sputter Physical Vapour Deposition system

The University Of Manchester Published 9 Apr 2020 Contracts Finder

key details

Statusactive
Category (CPV) 38000000
Deadline18 May 2020
Contract start30 Jun 2020
Contract end31 Jul 2021
Procedureopen
SME suitableNo
OCIDocds-b5fd17-5443b426-da43-4c16-adc6-2c27ef4c4a94

description

The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection.

The system should incorporate the following features, which may be provided in one or more systems: Multi-Target Sputter PVD System incorporating at least 2 sputter targets and bias capability to the targets and substrate.

A twin Electron Beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.

Additional information:

To express an interest in this project please visit the website below where you will need to register to obtain tender documentation.

https://in-tendhost.co.uk/universityofmanchester/aspx/Home

Is a Recurrent Procurement Type? : No

documents

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notice history

1 notice published against this procurement.

PublishedTypeRegimeNotice
9 Apr 2020 Tender (tender) · c532cb52-ebfb-412f-af4d-843e3f934de7-353734

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