Electron Beam and Sputter Physical Vapour Deposition system
key details
| Status | active |
|---|---|
| Category (CPV) | 38000000 |
| Deadline | 18 May 2020 |
| Contract start | 30 Jun 2020 |
| Contract end | 31 Jul 2021 |
| Procedure | open |
| SME suitable | No |
| OCID | ocds-b5fd17-5443b426-da43-4c16-adc6-2c27ef4c4a94 |
description
The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection.
The system should incorporate the following features, which may be provided in one or more systems: Multi-Target Sputter PVD System incorporating at least 2 sputter targets and bias capability to the targets and substrate.
A twin Electron Beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.
Additional information:
To express an interest in this project please visit the website below where you will need to register to obtain tender documentation.
https://in-tendhost.co.uk/universityofmanchester/aspx/Home
Is a Recurrent Procurement Type? : No
documents
- https://in-tendhost.co.uk/universityofmanchester/aspx/ , tenderNotice
- https://www.contractsfinder.service.gov.uk/Notice/c532cb52-ebfb-412f-af4d-843e3f934de7 , tenderNotice
Documents are linked, not mirrored. They are served by the publishing authority and may require registration.
notice history
1 notice published against this procurement.
| Published | Type | Regime | Notice |
|---|---|---|---|
| 9 Apr 2020 | Tender (tender) | · | c532cb52-ebfb-412f-af4d-843e3f934de7-353734 |
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source
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